Sputtering targets are materials used in the sputtering process to deposit thin films onto substrates. They comprise metals, alloys, ceramics, or composites. During sputtering, high-energy ions hit the target, dislodging atoms that then deposit onto the substrate. Metal targets produce conductive films, ceramic targets yield tailored properties, and composites offer unique characteristics. Magnetic targets are used for magnetic films. With sputtering targets, researchers and industries achieve precise, high-quality thin films for various applications.